Cleanser polymer

solvent-free removal of particles and other impurities from the wafer

Matrix polymer for FEOL resist

- KrF, thick film KrF (80 um)

- g, i line resists with special properties (SU-8 alike)

Redistribution layer

- variable electrical property, high Tg

Bumper layer 

 

Low loss IC substrate/ CCL  

 

 

Any other application you can think of? Sensor production, power electronics, micro reactors etc.. 

Please talk to us!